Effect of high-EUV-absorption element in chemically amplified resist system

Presentation information

Poster

Joint-1

Wed. Jul 26, 2023 5:10 PM - 7:40 PM Poster (Poster)

17:10-18:25 Odd-Numbered Presentation Time
18:25-19:40 Even-Numbered Presentation Time

5:10 PM - 7:40 PM

*Hyoeun Choi¹, Yejin Ku¹, Gyuchan Wy¹, Jin-kyun Lee¹, Jong-Won Lee², Byeong-Gyu Park², Sangsul Lee² (1. Inha Univ. (Korea), 2. POSTECH (Korea))

Keywords:EUV, EUVL, photolithography, photoresist

Abstract password authentication.
Password is required to view the abstract. Please enter a password to authenticate.