[F-1-1] Surface nanostructuring of silicon by intermediate-pressure hydrogen plasma treatment

〇Toshimitsu Nomura¹, Kenta Kimoto¹, Hiroaki Kakiuchi¹, Kiyoshi Yasutake¹, Hiromasa Ohmi¹ (1.Osaka university)

[F-1-2] Formation of Trench Pattern on Ge Surface by Enhanced Chemical Etching Using Chemically Modified Graphene Flakes

〇Ryo Mikurino¹, Ayumi Ogasawara¹, Tomoki Hirano¹, Kentaro Kawai¹, Kazuya Yamamura¹, Kenta Arima¹ (1.Osaka University)

[F-1-3] Plasma chemical vaporization machining of Ga₂O₃ using chlorine-based gas

〇Taiki Sai¹, Yuma Nakanishi¹, Satoshi Matsuyama¹, Kazuto Yamauchi¹, Yasuhisa Sano¹ (1.Osaka University)

[F-1-4] Deposition of polymer composite by low pressurized cold spray

〇Jongbeom Choi¹, Yuki Hirata¹, Naoto Ohtake¹, Hiroki Akasaka¹ (1.Tokyo Institute of Technology)

[F-1-5] Study on the growth of silicon films at low temperatures in atmospheric-pressure plasma excited by very high-frequency power

〇Shigeto Nawata¹, Masaya Maegawa¹, Hiromasa Ohmi¹, Hiroaki Kakiuchi¹, Kiyoshi Yasutake¹ (1.Osaka university)

[F-1-6] Characterization of silicon oxide thin films deposited at low temperatures using an atmospheric-pressure plasma-enhanced chemical vapor deposition technology

〇Masaya Maegawa¹, Sigeto Nawata¹, Hiromasa Ohmi¹, Hiroaki Kakiuchi¹, Kiyoshi Yasutake¹ (1.Osaka university)

[F-1-7] Diamond synthesis from graphite by hydrogen plasma induced chemical transport

〇Naoto Komatsu¹, Atsuhisa Togo¹, Hiroaki Kakiuchi¹, Kiyoshi Yasutake¹, Hiromasa Ohmi¹ (1.Osaka University)

[F-1-8] Gas composition dependence of material removal rate in plasma assisted polishing of single crystal diamond

〇Nian Liu¹, Naoya Yoshitaka¹, Kohki Sugawara², Hideaki Yamada³, Daisuke Takeuchi³, Yuko Akabane², Kenichi Fujino², Kentaro Kawai¹, Kenta Arima¹, Kazuya Yamamura¹ (1.Osaka University, 2.TDC Corporation, 3.National Institute of Advanced Industrial Science and Technology (AIST))

[F-1-9] Rapid surface nitriding of titanium alloy and stainless steel by a nanosecond laser

〇Kei Zako¹, Kazutoshi Katahira², Atsushi Ezura³, Jun Komotori¹ (1.Keio University , 2.Institute of Physical and Chemical Research, 3.Industrial Technology center of Tochigi Prefecture)

[F-1-10] Study of temperature measurement of burnishing process

Characteristics of Chip-Type Burnishing Tool Using by electro-conductive diamond

〇Hidetake Tanaka¹, Masato Takahashi¹ (1.Sophia University)

Session information

F-1 Advanced surface processings