F-1 Advanced surface processings

[F-1-5] Study on the growth of silicon films at low temperatures in atmospheric-pressure plasma excited by very high-frequency power

〇Shigeto Nawata¹、Masaya Maegawa¹、Hiromasa Ohmi¹、Hiroaki Kakiuchi¹、Kiyoshi Yasutake¹ (1.Osaka university)

キーワード：Others、low-temperature deposition、atmospheric-pressure plasma、thin film transistors、polyethylene naphthalate