スケジュール 19 13:50 〜 14:10 [2A508] Comparison of photoresist sensitivity between KrF, EB and EUV exposure *Yosuke Ohta1, Atsushi Sekiguchi1, Shinji Yamakawa2, Tetsuo Harada2, Takeo Watanabe2, Hiroki Yamamoto3 (1. Litho Tech Japan, 2. University of Hyogo, 3. National Institutes for Quantum Science and Technology)