The 39th International Conference of Photopolymer Science and Technology

講演情報

印刷

EUV Lithography

[2A516-19] EUV Lithography V

2022年6月29日(水) 16:55 〜 18:45 EUV Lithography (A5)

Chairman:Hiroto Kudoh(Kansai University), Shinji Yamakawa(University of Hyogo)

16:55 〜 17:25

[2A516] Process and Sensitivity Optimisation of the Multi-Trigger Resist [Invited]

Carmen Popescu1, Greg O'Callaghan1, Alexandra McClelland1, John Roth2, Ed Jackson2, *Alex Robinson1 (1. Irresistible Materials, 2. Nano-C)