[Th-P] Poster Presentation

[Th-P-06] Improvement of repeatability on N-type 4H-SiC epitaxial growth by high speed wafer rotation vertical CVD tool

*Yoshiaki Daigo¹, Akio Ishiguro¹, Shigeaki Ishii¹, Takehiko Kobayashi¹, Yoshikazu Moriyama¹ (1. NuFlare Technology, Inc.,(Japan))