Poster Session P4

[P4-32] Preparation of Al-doped and V-doped ZnO films by RF magnetron sputtering using mixed powder targets

*Tamiko Ohshima¹, Genya Kuroeda¹, Yoshinobu Matsuda¹, Hiroharu Kawasaki², Satoshi Takeichi², Yusuke Hibino², Takeshi Ihara², Yoshihito Yagyu², Takahiko Satake² (1. Nagasaki University, 2. National Institute of Technology, Sasebo College)