Session information

Parallel Sessions

Plasma Science and Technologies

[Tue-H1] Plasma Science and Technologies

Tue. Sep 13, 2022 12:30 PM - 1:45 PM Room H (Meeting Room 204)

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12:30 PM - 12:45 PM

[Tue-H1-4] In situ monitoring hydrogen fluoride molecular density and its effects on etch selectivity of SiN over SiO₂ films with hydrogen-contained fluorocarbon down-flow plasmas

*Shih-Nan Hsiao¹, Nicolay Britun¹, Thi-Thuy-Naga Nguyen¹, Takayoshi Tsutsumi¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (1. Nagoya University (Japan))

12:45 PM - 1:00 PM

[Tue-H1-5] Machine learning and contribution analysis of radicals to the properties of hydrogenated amorphous carbon films grown by a plasma-enhanced chemical vapor deposition

*Hiroki Kondo¹, Jumpei Kurokawa¹, Kenji Ishikawa¹, Takayoshi Tsutsumi¹, Makoto Sekine¹, Masaru Hori¹ (1. Nagoya University (Japan))

1:00 PM - 1:45 PM

[Tue-H1-6K] Control of charged particle dynamics for process optimization in technological high frequency plasmas

*Julian Schulze¹ (1. Ruhr-University Bochum (Germany))

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