[Tue-E2] ISSP / Surface Engineering

[Tue-E2-3] On the growth of Ti and Al films on inner wall of millimeter-sized hole by high-power impulse magnetron sputtering

*Hidetoshi Komiya¹, Yoshikazu Teranishi², Ming Yang¹, Tetsuhide Shimizu¹ (1. Tokyo Metro. Univ. (Japan), 2. Tokyo Metro. Ind. Tech. Res. Inst. (Japan))

キーワード：HiPIMS, Small hole, Inner-wall, Peak current density, Ion content, Trajectory