Role of molecularly-adsorbed O2 on oxidation at SiO2/Si(001) interface

Yasutaka Tsuda

15:00 〜 15:15

[Tue-F2-1] Role of molecularly-adsorbed O₂ on oxidation at SiO₂/Si(001) interface

*Yasutaka Tsuda¹, Akitaka Yoshigoe¹, Shuichi Ogawa², Tetsuya Sakamoto¹, Yuji Takakuwa² (1. Japan Atomic Energy Agency (Japan), 2. Tohoku University (Japan))

キーワード：silicon, oxidation, surface, interface

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講演情報

[Tue-F2] Joint session of Advanced light spectroscopy and Surface Science

[Tue-F2-1] Role of molecularly-adsorbed O₂ on oxidation at SiO₂/Si(001) interface

講演情報

[Tue-F2] Joint session of Advanced light spectroscopy and Surface Science

[Tue-F2-1] Role of molecularly-adsorbed O2 on oxidation at SiO2/Si(001) interface

[Tue-F2-1] Role of molecularly-adsorbed O₂ on oxidation at SiO₂/Si(001) interface