[Tue-H1] Plasma Science and Technologies

[Tue-H1-5] Machine learning and contribution analysis of radicals to the properties of hydrogenated amorphous carbon films grown by a plasma-enhanced chemical vapor deposition

*Hiroki Kondo¹, Jumpei Kurokawa¹, Kenji Ishikawa¹, Takayoshi Tsutsumi¹, Makoto Sekine¹, Masaru Hori¹ (1. Nagoya University (Japan))

キーワード：plasma-enhanced chemical vapor deposition, radical, hydrogenated amorphous carbon, machine learning, Contribution analysis, Random forest