*Ryosuke YAMAGATA¹, Hirotoyo Nakashima², Takaomi Itoi¹, Masao Takeyama² (1. Chiba University, 2. Tokyo Institute of Technology)

*Toshiaki HORIUCHI¹, Konatsu Yamada¹, Seiji Miura², Frank Stein³ (1. Hokkaido Univ. of Sci., 2. Hokkaido Univ., 3. MPI-SusMat)

*Konatsu YAMADA¹, Toshiaki HORIUCHI¹, Ken-ichi IKEDA², Seiji MIURA³, Frank STEIN³ (1. Hokkaido Univ. of Sci., 2. Hokkaido Univ., 3. MPI-SusMat)

*Roonie Protasius¹, Shigeto Yamasaki¹, Tatsuya Morikawa¹, Kazuyuki Yagi², Masaki Tanaka¹, Masahiko Tezuka³ (1. Department of Materials, Kyushu University, Japan、2. Department of Mechanical Engineering, Kyushu University, Japan、3. Next LM development Department, X-Ray Tube Engineering Division, Canon Electron Tubes & Devices Co., Ltd., Japan)

*Daisuke EGUSA¹, Konatsu YAMADA², Toshiaki HORIUCHI², Frank STEIN³, Eiji ABE^1,4 (1. University of Tokyo, 2. Hokkaido University of Science, 3. Max-Planck-Inst., 4. NIMS)

*Hiroki IWANUMA¹, Chihiro Watanabe², Norimitsu Koga², Hiromi Miura³ (1. Kanazawa University, 2. Kanazawa University, 3. Toyohashi University of Technology)

*Seung　Zeon Han¹, Eun-Ae Choi¹ (1. Korea Institute of Materials Science)

*Atushi KOZAKI¹, Morishige Taiki², Tanaka Tsutomu³ (1. Graduate School of Science and Engineering , Kansai Univ., 2. Kansai Univ., 3. Osaka Research Institute of Industrial Science and Technology.)

*Tsukasa KAKINUMA¹, Chihiro WATANABE², Norimitsu KOGA², Hiromi MIURA³ (1. Kanazawa University （Master）, 2. Kanazawa University, 3. Toyohashi University of Technology)

*Dongsheng Fu¹, Si Gao¹, Wu Gong², Wenqi Mao³, Nobuhiro Tsuji¹ (1. Kyoto Univ., 2. JAEA J-PARC Center, 3. JAEA J-PARC Center (Present: Northeastern Univ. (China)))

*Takahiro Kunimine¹, Takeshi Inamura², Naoya Nishikawa¹, Reza Gholizadeh³, Nobuhiro Tsuji³ (1. Kanazawa University, 2. Kanazawa University (Present: Sumitomo Electric Industries, Ltd.), 3. Kyoto University)