[28p-G19-1~17] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[28p-G19-6] Fabrication of Atomically-Flat ZnO films on C-Plane Sapphire Substrates by Sputtering

^○Naho Itagaki^1,2, Kazunari Kuwahara¹, Daisuke Yamashita¹, Hyunwoong Seo¹, Kunihiro Kamataki³, Giichiro Uchida¹, Kazunori Koga¹, Masaharu Shiratani¹ (Kyushu Univ¹, JST-PRESTO², Kyushu Univ³)

Keywords:酸化亜鉛、エピタキシャル成長、スパッタリング