[29p-B9-1~7] 8.6 プラズマ現象･新応用･融合分野

[29p-B9-5] ▲Analysis of Plasma Potential in Photoemission-Assisted Plasma Used for Dry Planarization Process (2:30 PM ～ 2:45 PM)

^○Saijian Ajia¹, Yudai Ohtomo¹, Shuichi Ogawa¹, Yuji Takakuwa¹ (Tohoku Univ.¹)

キーワード：Photoemission-Assisted plasma、Surface planarization process、Langmuir probe