[18a-D8-1~12] 13.2 Insulator technology

△ [18a-D8-4] Detailed study of the relationship between SiO2 degradation and hydrogen movement using nuclear reaction analysis

^○Yusuke Higashi¹, Riichiro Takaishi¹, Masamichi Suzuki¹, Koichi Kato¹, Mitsuhiro Tomita¹, Yuichiro Mitani¹, Masuaki Matsumoto², Shohei Ogura², Katsuyuki Fukutani² (Toshiba Corp.¹, Tokyo Univ.²)

Keywords:絶縁膜信頼性