[13p-1F-1~2] 8.8 プラズマエレクトロニクス分科内招待講演

▲ [13p-1F-2] [Invited lecture of overseas researcher] Integrated Approaches for Surface Chemistry Control in Plasma Processing

〇Peter L. G. Ventzek¹, H. Ueda², Y. Kobayashi², T. Iwao², K. Ishibashi², A. Ranjan³, M. Wang³, A. Suzuki², H. Higuchi², B. Lane¹, R. Upadhyay⁴, G.S. Hwang⁵, L. Raja⁵, A. Koshiishi⁶ (1.Tokyo Electron America Inc., 2.Tokyo Electron Ltd., 3.Tokyo Electron Tech. Center America, 4.Esgee Tech., 5.Univ. of Texas at Austin, 6.Tokyo Electron Miyagi Ltd.)

キーワード：Plasma Processing,Surface Chemistry