[13p-PB6-1~20] 21.1 Joint Session K

[13p-PB6-9] Air annealing treatment of ZnO layer grown by UHV sputtering (IV)

〇(M2)Kenji Matsuhisa¹, Hiroki Sakuma¹, Tsubasa Hatori¹, Kazuki Watanabe¹, Ai Mizuno¹, Hiroyuki Shinoda¹, Nobuki Mutsukura¹ (1.Tokyo Denki Univ.)

Keywords:ZnO,oxide semiconductor,sputtering