2015年 第76回応用物理学会秋季学術講演会

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一般セッション(口頭講演)

6 薄膜・表面 » 6.4 薄膜新材料

[15a-2J-1~8] 6.4 薄膜新材料

2015年9月15日(火) 09:00 〜 11:45 2J (223)

座長:遠藤 和弘 (金沢工大)

10:00 〜 10:15

[15a-2J-3] High-temperature H2O beam generated by a catalytic reaction for the growth
of metal oxide thin films

Yusuke Teraguchi1, Tomoki Nakamura1, Kazumasa Takahashi1, Yasuhiro Tamayama1, Takahiro Kato1, 〇Kanji Yasui1 (1.Nagaoka Univ. Technol.)

キーワード:metal oxide film growth,catalytic reaction,de Laval nozzle

The high-temperature H2O was generated in a catalytic cell and was effused through a de Laval nozzle to the reaction zone in the CVD chamber for metal oxide film growth. In this study, the temperature of the high-energy H2O beam in the nozzle was estimated according to the theory of compressible flow for various opening angles of the de Laval nozzle, and the cluster size in the H2O beam was also estimated. The H2O beam temperature decreased with the opening angle, due to the difference in the cooling rates of the H2O beam through the adiabatic expansion process. The H2O cluster size was estimated using Hagena's empirical formula. For all H2O nozzles, the reduced scaling parameters (Γ*) were smaller than 200 and the mean cluster sizes (<n>) were estimated to be less than 1 with an initial gas temperature and pressure of 1273 K and 1×103-2×105 Pa, respectively.