2015年 第76回応用物理学会秋季学術講演会

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一般セッション(ポスター講演)

9 応用物性 » 9.2 ナノワイヤ・ナノ粒子

[15a-PB1-1~16] 9.2 ナノワイヤ・ナノ粒子

2015年9月15日(火) 09:30 〜 11:30 PB1 (白鳥ホール)

09:30 〜 11:30

[15a-PB1-4] Fabrication of Nanoimprint-SiNW Solar Cells with Optimized p-matrix Coverage

〇Wipakorn Jevasuwan1, Kiyomi Nakajima1, Yoshimasa Sugimoto1, Naoki Fukata1 (1.NIMS)

キーワード:Nanoimprint,Nanowires,Solar cells

The conical or cylindrical shape of nanowire (NW) structures is favorable for photovoltaic applications owning to many advantages such as increasing of light trapping and junction area. However, NW synthesis methods for large scale fabrication are still being in challenge and their potential application to highly efficient solar cells has been intensively investigated. In this work, 3D-structure solar cell fabrication was achieved using n-Si NWs synthesized by nanoimprint and Bosch process. Solar cell efficiency upon 6% for an active area of 1 cm2 was simply optimized by p-Si matrix coverage and two-step H2 annealing technique. Optimized p-Si matrix coverage enhanced solar cell performances by reducing of contact resistance and increasing of Voc and Isc. H2 annealing reduced defect densities on n-SiNW surface and inside p-Si layer, and improved p-Si crystallinity.