The 62nd JSAP Spring Meeting, 2015

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13 Semiconductors » 13.4 Si wafer processing /MEMS/Integration technology

[14a-A29-1~11] 13.4 Si wafer processing /MEMS/Integration technology

Sat. Mar 14, 2015 9:00 AM - 12:00 PM A29 (6A-204)

10:00 AM - 10:15 AM

[14a-A29-5] Antimony diffusion into Ge substrate for n-well formation

〇Ryota Yoneda1, Keisuke Yamamoto2, Hiroshi Nakashima2 (1.IGSES, Kyushu Univ, 2.KASTEC, Kyushu Univ.)

Keywords:Germanium,CMOS