[15p-P2-1~15] 6.2 カーボン系薄膜

[15p-P2-8] 超ナノ微結晶ダイヤモンド／水素フリーアモルファスカーボン混相膜の超鋼へのハードコーティング

〇吉武 剛¹、エギザ モハメド^1,2、楢木野 宏¹、冨永 亜希¹、村澤 功基³、権田 英修³、櫻井 正俊³ (1.九大総理工、2.カフルシェイフ大、3.オーエスジー（株）)

キーワード：ナノダイヤモンド、硬質皮膜、同軸型アークプラズマガン

Ultrananocrystalline diamond(UNCD)/nonhydrogenated amorphous carbon (a-C) composite (UNCD/a-C) films were deposited on cemented carbide containing Co by coaxial arc plasma deposition. The film deposited at room temperature exhibited the maximum hardness of 51.3 GPa and Young’s modulus of 520 GPa, which evidently indicates that graphitization induced by Co in the WC substrates and thermal deformation from sp³ to sp² bonding are suppressed. The hard UNCD/a-C films can be deposited at a thickness of approximately 3 µm, which is an order larger than that of comparably hard a-C films. The internal compress-stress of the 51.3-GPa hardness film is 4.5 GPa, which is evidently smaller than that of comparably hard a-C films. This is a reason for the thick deposition. The presence of a large number of grain boundaries in the film, which is a structural specific to UNCD/a-C films, might play a role in releasing the internal stress of the films.