2016年 第77回応用物理学会秋季学術講演会

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一般セッション(口頭講演)

13 半導体 » 13.7 ナノ構造・量子現象

[16a-A26-1~7] 13.7 ナノ構造・量子現象

2016年9月16日(金) 10:00 〜 11:45 A26 (203-204)

岡本 創(NTT)

10:15 〜 10:30

[16a-A26-2] Strain relaxation in submonolayer InAs/GaAs quantum structures

Yuwei Zhang1、Itaru Kamiya1 (1.Toyota Tech. Inst.)

キーワード:MBE, submonolayer quantum well

Up-converted photoluminescence (UPL) in semiconductor quantum dots (QDs) and quantum wells (QWs) has attracted much attention in recent years for applications such as intermediate band solar cells. Recently, we reported the importance of confined states for improving the efficiency which can be formed by monolayer thick InAs QWs. However, the lattice mismatch between InAs and GaAs limits the stacking numbers of QDs and QWs, and further the UPL efficiency. In this paper, we study the effect of strain relaxation on the optical properties of InAs/GaAs MQW structures submonolayer (SML) InAs layers.