[16a-P4-1~8] 13.3 絶縁膜技術

▲ [16a-P4-3] Effect of Added Organic Solution on Low-Temperature Deposition of SiO_x Films by APCVD using Silicone Oil and Ozone Gas

〇(D)Puneet Jain¹、Susumu Horita¹ (1.Japan Adv. Inst. Sci. & Tech. (JAIST))

キーワード：Silicon Oxide Film, Low-Temperature Deposition, APCVD

SiO_x films are formed by APCVD using silicone oil and ozone. These films have non-negligible amout of Si-OH bonds due to H₂O. In order to enhance deposition rate and reduce amount of Si-OH bond, we tried to add some organic solution to silicon oil vapor and O₃ gas. Adding organic solution was found to influence the deposition rate strongly and content of Si-OH bond slightly. In the meeting, we will show more detailed data under various deposition conditions and discuss them.