13:15 〜 13:30 ▼ [21p-H103-1] Flux-mediated epitaxy growth of ferroelectric relaxor Bi-based for high-temperature functional capacitors 〇Benioub Rabie1、Heddadj Sidi Mohammed1、伊髙 健治2 (1.弘前大 理工、2.弘前大 新エネ研)