4:15 PM - 4:30 PM
△ [19p-W621-7] Feasibility study of monitoring of inner walls of plasma etching chamber using load impedance monitoring system
Keywords:plasma impedance,particle,deposited film
Presentation information
Oral presentation
8 Plasma Electronics » 8.4 Plasma etching
[19p-W621-1~12] 8.4 Plasma etching
Sat. Mar 19, 2016 2:30 PM - 5:45 PM W621 (W6)
Hisataka Hayashi(TOSHIBA), Koji Eriguchi(Kyoto Univ.)