2016年第63回応用物理学会春季学術講演会

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一般セッション(ポスター講演)

15 結晶工学 » 15.5 IV族結晶,IV-IV族混晶

[21p-P9-1~9] 15.5 IV族結晶,IV-IV族混晶

2016年3月21日(月) 13:30 〜 15:30 P9 (屋内運動場)

13:30 〜 15:30

[21p-P9-9] Formation of Large-grain polycrystalline Si Layer on Quartz by Al-induced Crystallization for Thin-Film Solar Cells

Suwardy Joko1,2、Subramani Thiyagu2、〇Jevasuwan Wipakorn2、Toko Kaoru1、Suemasu Takashi1、Fukata Naoki1,2 (1.Univ. of Tsukuba、2.NIMS)

キーワード:Aluminum-induced crystallization,Si

Aluminum-induced crystallization (AIC) have been intensively investigated as one of the alternative for low temperature post-crystallization Si. Several groups have already reported the fabrication of AIC-based Si thin film solar cells. However, the efficiency is much lower than that for conventional wafer Si solar cells. Therefore, the intrinsic crystalline qualities of AIC poly-Si such as grain size and crystal-orientations have to be optimized. In this study, we optimized the growth parameters of poly-Si seed layer formation on quartz substrates. Furthermore, solid phase epitaxy (SPE) on AIC seed layer was investigated to form thicker crystalline Si layer.