The 78th JSAP Autumn Meeting, 2017

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[5p-A202-1~18] 6.3 Oxide electronics

Tue. Sep 5, 2017 1:15 PM - 6:00 PM A202 (202)

Hisashi Shima(AIST), Yusuke Nishi(Kyoto Univ.)

4:30 PM - 4:45 PM

[5p-A202-13] Hydrogen gas sensor device utilizing resistive change of Ta2O5

Hisashi Shima1, 〇Yasuhisa Naitoh1, Zhiqiang Wei2, Kazunari Homma2, Satoru Fujii2, Touru Sumiya1, Hiroyuki Akinaga1 (1.NeRI AIST, 2.PSCS)

Keywords:hydroge gas sensor, resistive random access memory, nanogap

The reliable sensing of the hydrogen gas encourages the use of hydrogen energy technology, which frees our society from the dependence on the conventional fossil fuel. We could achieve that highly sensitive hydrogen gas sensor device based on the Ta2O5 thin film and Pt electrode by applying forming operation to the device.