2017年第78回応用物理学会秋季学術講演会

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CS コードシェアセッション » 【CS.10】10.1 新物質・新機能創成(作製・評価技術),10.2 スピン基盤技術・萌芽的デバイス技術, 10.3 スピンデバイス・磁気メモリ・ストレージ技術のコードシェアセッション

[5p-C18-8~21] 【CS.10】10.1 新物質・新機能創成(作製・評価技術),10.2 スピン基盤技術・萌芽的デバイス技術, 10.3 スピンデバイス・磁気メモリ・ストレージ技術のコードシェアセッション

2017年9月5日(火) 14:45 〜 19:00 C18 (C18)

野崎 友大(東北大)

15:45 〜 16:00

[5p-C18-11] Voltage-controlled magnetic anisotropy of Fe/Pd/MgO system

〇(DC)Joko Suwardy1、Kohei Nawaoka1、Minori Goto1,2、Yoshishige Suzuki1,2、Shinji Miwa1,2 (1.Osaka Univ、2.CSRN)

キーワード:Voltage-controlled magnetic anisotropy, Pd, Spin-wave

The interfacial perpendicular magnetic anisotropy (PMA) of magnetic multilayer can be enhanced by inserting a large spin-orbit interaction material such as Pd [1]. Moreover, an attempt to find high PMA modulation by using voltage is very important for realizing high-density magnetic random-access memory [2]. We have reported the voltage-controlled magnetic anisotropy of Fe/Pd/MgO multilayer by analyzing spin-wave dynamics [3]. In the present study, we investigated post-annealing influences on voltage-controlled magnetic anisotropy (VCMA) of Fe/Pd/MgO.
The epitaxial multilayer stacks MgO(001) substrate/MgO(5 nm)/V(20 nm)/Fe(20 nm)/Pd(tPd=0-1 nm)/MgO(5 nm) was fabricated using the molecular beam epitaxy under ultrahigh vacuum. After that, the sample was encapsulated by sputtering of 50 nm SiO2. Micro-sized antennas were prepared onto it to generate and detect spin-waves. An in-plane external magnetic field is applied normal to the spin-wave propagation direction to excite magnetostatic surface spin-wave (MSSW). Using a vector network analyzer, the frequency shift of S21 signal under voltage was characterized. Figure 2 shows the voltage-induced interfacial magnetic anisotropy energy at several post-annealing temperatures. The result shows the increasing of Pd-thickness decrease the energy change. It is similar to sputter-deposited Co/Pd system [3] which can be explained by induced magnetic moment in Pd at MgO interface. Furthermore, the annealing treatment affected the VCMA, which should be correlated to the interfacial was attributed to Fe/Pd interfacial state change. The trend showed an increase by annealing for all Pd-thickness, where the maximum value reached ~40 fJ/Vm obtained at tPd = 0.2 nm (1 ML) annealed at 250 oC. Interestingly, the polarity change was observed for 1.2 nm Pd-insertion sample with 300°C annealing.