[5p-PA2-1~29] 12.1 Fabrications and Structure Controls

[5p-PA2-27] Evaluation of rotary cathode Al sputtering damage on the Alq₃ thin film (Ⅱ)

〇Hiroki Sugawara¹, Toshiharu Uchida¹, Takashi Takemi¹, Daisuke Aonuma¹ (1.Canon Tokki Corp.)

Keywords:Spputtering

For large size of the OLED display, we consider its upper electrode by sputtering method. Using the Al rotary cathode, we estimated sputtering damage to Alq₃ film by photoluminescence(PL). As the result of stationary deposition, the PL intensity was decreased when deposition time become long. We found out that more than 200 nm Al sputtering still do Alq₃ film damaged.