[15p-318-1~11] CS.4 7. Code-sharing Session: Beam Technology and Nanofabrication

[15p-318-11] Particle emission from the target of EUV source through laser ablation

〇Akira Sasaki¹, Atsushi Sunahara², Katsunobu Nishihara³, Takeshi Nishikawa⁴ (1.QST, 2.ILT, 3.ILE Osaka Univ., 4.Okayama Univ.)

Keywords:EUV lithography, laser produced plasma, simulation

We investigate the simulation model of the laser produced plasma EUV source to analyze the particle emission from the target and subsequent interaction with heating laser pulse. We introduce algorithms of the dynamic reorganization of the grid into the two dimensional Lagrangian hydrodynamics, which allows one to place grids according to the distribution of the material including particle and bubbles. Combining with the theory of phase transition based on the Van-der-waals equation of state, the formation and spatial and temporal evolution of particles and bubbles is taken into account.