[16p-315-1~11] Recent GFIS microscopy technology and its future prospects for R & D of materials and devices

▲ [16p-315-6] Neon GFIS Gas Assisted Etch and Beam Induced Deposition -Characterization for Semiconductor Applications-

〇Richard H. Livengood¹, Shida Tan¹, Roy M. Hallstein¹, Waqas Ali¹ (1.Intel Corporation)

Keywords:GFIS