The 79th JSAP Autumn Meeting, 2018

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Poster presentation

15 Crystal Engineering » 15.5 Group IV crystals and alloys

[19p-PB7-1~7] 15.5 Group IV crystals and alloys

Wed. Sep 19, 2018 4:00 PM - 6:00 PM PB (Shirotori Hall)

4:00 PM - 6:00 PM

[19p-PB7-1] Fabrication of strained SiGe (111) -On-Insulator substrate by selective etching

〇Shuichiro Ohshima1, yu Sakamoto1, Michihiro Yamada2, Kohei Hamaya2, kentarou Sawano1 (1.Tokyo City Univ., 2.Osaka Univ.)

Keywords:semiconductor, Ge