[21p-223-1~12] 7.2 Applications and technologies of electron beams

[21p-223-12] Focusing an Electron-Beam Array with a Multi-hole Permanent Magnet

〇Kazuki Hiraoka¹, Katsuhide Tsuno², Taeko Ando³, Kazuhiro Shimonomura³, Etoh Takeharu³ (1.Advanced Science Laboratory, Inc., 2.EOS Tsuno, 3.Ritsumeikan Univ.)

Keywords:Electron beam array, Permanent magnet, High-speed imaging

A simulation study confirmed technical feasibility of a magnetic lens with a multi-hole permanent magnet to focus an electron beam array. Contrary to prior anticipation, the magnet field intensity is substantially flat in the central area of the multi-hole permanent magnet with the diameter of 6 mm. Only a slight non-uniformity is observed in the radius direction in the area. Though the outer edge of the magnet strongly distorts the intensity distribution on the peripheral area, the area of the influence is only 1 mm wide. The beam convergence rate in the uniform area is around 1/10 for a simple basic model, and 1/40 for an improved model.An application of the technology is proposed to ultra-high-speed imaging with the temporal resolution of picoseconds.