2018年第65回応用物理学会春季学術講演会

講演情報

一般セッション(口頭講演)

7 ビーム応用 » 7.4 量子ビーム界面構造計測

[17a-F202-1~11] 7.4 量子ビーム界面構造計測

2018年3月17日(土) 09:00 〜 12:15 F202 (61-202)

羽田 真毅 (岡山大)、高橋 正光(量研機構)、鈴木 秀士(名大)

09:00 〜 09:15

[17a-F202-1] X-ray optical sectioning microscopy: towards visulization of buried function layers and interfaces in thin films (I)

〇(D)Wenyang Zhao1,2、Kenji Sakurai2,1 (1.Tsukuba Univ.、2.NIMS)

キーワード:optical sectioning, buried function layers, microscopy

Periodically-packed multilayers play an important role in many material systems including semiconductors, magnets and optical devices. Generally speaking, performance of these materials are mostly determined by the perfect periodicity of multilayers and the homogeneity of every layer. Therefore, defects such as inhomogeneous impurity and layer distortion may dramatically decrease the performance, and hence they should be carefully inspected and specially discussed. However, because every buried function layer is generally only a few nanometers thick, it is very difficult to detect the exact depth of the defects in a non-destructive way. For this reason, we developed a new technique of X-ray optical sectioning microscopy. It has a nano-level depth resolution and it is especially sensitve to buried function interface. It is going to be applied to many material systems such as Q-state semiconductors preparation, 2D materaials and so on.
This talk is going to disucss the therotical background, the current achievements and future research applications of X-ray optical sectionging microscopy.