[17p-F206-1~17] 13.3 Insulator technology

[17p-F206-3] Degradation of surface flatness and change of oxidation mechanism during Ge oxidation

〇Senri Takemura¹, Shigehisa Shibayama¹, Tomonori Nishimura¹, Takeaki Yajima¹, Akira Toriumi¹ (1.The Univ. of Tokyo)

Keywords:germanium, oxidation, flatness