9:30 AM - 9:45 AM
[20a-C204-3] Formation of C-Axis-Oriented Aluminum Nitride Thin Films with Plasma Enhanced Reactive Pulsed DC Magnetron Sputtering
Keywords:Aluminum Nitride, Sputtering
Presentation information
Oral presentation
8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment
[20a-C204-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment
Tue. Mar 20, 2018 9:00 AM - 12:15 PM C204 (52-204)
Masanori Shinohara(Natl. Inst. of Tech.,Sasebo Col.)