[18p-E208-1~13] 4.1 Plasmonics and Nanophotonics

▲ [18p-E208-2] Characterization of octagonal silicon pillar for meta-atom of dielectric metasurface

〇Kentaro Iwami¹、Chikara Ogawa¹ (1.Tokyo Univ. Agri. Tech.)

キーワード：metasurface, Dielectric, Electron beam lithography

In this research, in order to use the character projection (CP) feature of a leading-edge EB writer, ADVANTEST F7000S-VD02, optical characteristics of octagonal silicon pillars with different feature sizes which are CP capable are numerically studied. A commercially available finite element method simulator, COMSOL Multiphysics 5.1 are used to simulate electromagnetic field. Phase shift covering whole range of 2π can be achieved by using dedicated CP size range.