[20p-E319-1~10] 【CS.6】 6.5 表面物理・真空と7.6 原子・分子線およびビーム関連新技術のコードシェアセッション

▼ [20p-E319-5] Rapid-temperature-rising induced reduction of NiO film grown on Ni(111) surface

〇(M1)BINGRUO ZHANG¹、Nobuhisa Kamata¹、Shuichi Ogawa¹、Akitaka Yoshigoe²、Yuji Takakuwa¹ (1.IMRAM Tohoku Univ.、2.JAEA)

キーワード：oxidation, real-time XPS, Ni(111)

To clarify the potential of Ni surfaces as an alternative catalyst of Pt for exhaust gases of automobiles, the oxidation and reduction reaction kinetics on Ni(111) surfaces were investigated by X-ray photoelectron spectroscopy using synchrotron radiation (hv = 1100 eV) at BL23SU, SPring-8. By annealing at 700℃ under H₂ atmosphere at P_H2 = 9×10^-4 Pa for 600 s, there were no traces of carbon, oxygen, sulfur, and chlorine contaminants within the detection limit.