09:45 〜 10:00
▼ [10a-M103-4] Deposition Control of Carbon Nanoparticles Synthesized Using Ar + CH4 Multi-Hollow Discharges
キーワード:multi-hollow discharge plasma chemical vapor deposition, Carbon nanoparticles
Carbon nanoparticles (CNPs) are regarded as one of the central materials in nanotechnology. In this study, we have applied Ar + CH4 multi-hollow discharge plasma chemical vapor deposition (MHDPCVD) process to synthesis of CNPs and their deposition on substrates. The produced particle size was nearly the same in a range between 5 and 30 nm. However, nonlinear deposition rate indicates that the deposition mechanism is not simple.