2020年第81回応用物理学会秋季学術講演会

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13 半導体 » 13.7 化合物及びパワー電子デバイス・プロセス技術

[10p-Z04-1~17] 13.7 化合物及びパワー電子デバイス・プロセス技術

2020年9月10日(木) 13:00 〜 17:30 Z04

佐藤 威友(北大)、久保 俊晴(名工大)

14:15 〜 14:30

[10p-Z04-6] Side gate modulation of AlGaN/GaN HEMTs on GaN with C and Fe doped buffers

〇(PC)Maria Villamin1、Takaaki Kondo1、Naotaka Iwata1 (1.Toyota Technological Institute)

キーワード:GaN, HEMT, buffer layer

Side gate modulation of AlGaN/GaN HEMTs on GaN substrate with C and Fe doped buffers is investigated. Evidence of larger memory effect in HEMT on C-doped GaN buffer (C-doped GaN), compared to on Fe-doped GaN buffer (Fe-doped GaN), is demonstrated as shown in the hysteresis feature of drain current (ID) using dual-sweep side gate (SG) measurements. C-doped GaN and Fe-doped GaN were used in this study with SG contact located at the device border separated with a distance of 6 µm, and etched 100 nm below the surface. SG modulation was done by sweeping SG voltage (VSG) from -28 V to 8 V, and 8 V to -28 V while monitoring drain current (ID). The drain-to-source voltage was kept at 6 V, while the gate voltage was kept at 0 V (on state). Results on C-doped GaN show an apparent hysteresis feature in IDVSG but it is not evident in Fe-doped GaN. This implies that memory effect exists in C-doped GaN. Moreover, our result shows decrease in ID at negative VSG, which is inferred to be due to the field modulation caused by the side gate. Based on our experimental data, it can be concluded that C-doped GaN has a ID hysteresis feature and is less stable to SG modulation as compared to Fe-doped GaN.