[9a-Z05-1~8] 6.4 薄膜新材料

▲ [9a-Z05-2] Influence of Oxygen and Nitrogen Background Gas in Femtosecond Pulsed Laser Deposition of Nd:YAG Laser Crystal

〇Lean Dasallas¹、Joy Kristelle De Mata¹、Arriane Lacaba^2,3、Wilson Garcia³ (1.Material Science and Engineering Program, College of Science, University of the Philippines、2.Maxim Philippines Operating Company、3.National Institute of Physics, University of the Philippines)

キーワード：pulsed laser deposition, femtosecond laser, thin film

The effects of nitrogen and oxygen background gases to the properties of femtosecond pulsed laser deposited Nd:YAG thin film are investigated. Our results show differences in the reflectivity and FTIR spectra of the thin films. These differences may be attributed to the nucleation behavior as dictated by the free energy per unit volume. The experiment showed that background gas can be used to control and improve properties of the femtosecond pulsed laser deposited Nd:YAG film.