[14p-PB7-1~29] 12.3 Functional Materials and Novel Devices

[14p-PB7-13] Resolution limit of fine Mg pattern on selective metal-vapor deposition of diarylethene

〇(B)Shoko Isida¹, Tsuyoshi Tsujioka¹ (1.Osakakyoiku Univ.)

Keywords:photochromism, diarylethene, selective metal deposition

Diarylethene (DAE), in which the glass transition temperature changes significantly with photoisomerization, exhibits selective metal deposition. In order to investigate resolution limit of fine metal pattern, an isomerization pattern was formed on DAE film on a photomask substrate, and the obtained Mg pattern was observed. When the line & space pitch of the colored / colorless portion was 2.6 μm, Mg deposition was observed even in the colorless surface. This is because the Mg atoms diffused from the colored surface to the colorless surface, and the diffusion lead high-atom density for easy nucleation.