[17a-Z31-1~10] 17.2 グラフェン

▲ [17a-Z31-6] Transmissible plasma evolved graphene: a noble approach of graphene production

〇(P)Kamal Prasad Sharma¹、Aliza Khaniya Sharma¹、Daiki Yamamoto¹、Toru Asaka²、Takahiro Maruyama¹ (1.Meijo Univ.、2.Nagoya Inst. Technol.)

キーワード：Graphene, Pulsed arc plasma, Transmissible plasma-evolved graphene

The chemical vapour deposition (CVD) of carbon feedstock onto a catalyst surface, carbon species that are excited by a plasma, and high-energy laser irradiation of carbon surfaces are important methods for graphene production. Among them, plasma enhanced CVD (PECVD) utilizing microwave plasma, surface wave plasma, or radio frequency (rf) plasma has been realized as one of the most popular techniques to synthesize graphene at low temperature and with short processing time. However, for most CVD and PECVD techniques, time-consuming transfer and chemical treatment processes are essential to produce graphene for subsequent applications. Here, we propose a simple technique to produce suspended graphene with a short processing time and very low temperature by employing a pulsed arc plasma deposition (APD) and termed as transmissible plasma evolved graphene (TPEG).