[24p-F308-1~11] CS.1 2.3 加速器質量分析・加速器ビーム分析、7.5 イオンビーム一般のコードシェアセッション

▲ [24p-F308-7] EMIM-BF₄ multi-ion sources of micromachined Si external wetted emitters with fluidic feeding-flow confinement: from microfabrication to Si etching evaluation

〇VANMINH LE¹、NGUYEN VAN CHINH¹、HIROKI KUWANO^1,2 (1.Tohoku University、2.Sendai Smart Machines)

キーワード：Ionic liquid ion source, ion source, micro/nano fabrication

In this research, we developed micromachined multi-ion sources (multi-IS) for generating fluorine-based ions from ionic liquid EMIM-BF₄. The multi-IS consisted of 10 x 10 Si micro-emitters using Si micromachining. Each emitter was surrounded by four-segmented annular micro-fluidic channels of 10 mm in width. The ion emission evaluation confirmed that the fabricated EMIM-BF₄ ISs were consistent with the exponential charge transport model. Si etching investigation showed the maximum etching yield of 17 atoms per ion was achieved.