[15p-PA03-1~18] 12.1 Fabrications and Structure Controls

[15p-PA03-5] Structure and Characteristics of Vapor-Deposited Naphthalenediimide Derivatives

〇(M1)Suguru Kuratomi¹, Usui hiroaki¹, Tatewaki Yoko¹, Usui Satoshi² (1.Tokyo Univ. Agricul. & Technol., 2.Niigata Univ.)

Keywords:vapor deposition, Thin film orientation, Thin film characteristics

Thin films were prepared by vapor deposition ofN,N’-bis(p-vinylphenyl)naphthalene diimide (PVP-NDI), a distyl amine, and N,N’-bis(p-vinylbenzyl)naphthalene diimide(PVB-NDI), a dstyryl amine of naphthalene, resectively. Compared to PVB-NDI, PVP-NDI showed eminent absorption by C-N stretching of IR-RAS spectra, and clear X-ray diffraction peaks at small angles. Moreover, electrical conductivity of PVP-NDI was higher than that of PVB-NDI by 300 times. It is considered that the rigid structure of PVP-NDI enhances their molecular orientation.