High-quality superconducting IV-nitride thin films prepared by MBE

Kosuke Takiguchi; Yoshiharu Krockenberger; Yoshitaka Taniyasu; Hideki Yamamoto

Presentation information

Oral presentation

11 Superconductivity » 11.1 Fundamental properties

[17a-D209-1~8] 11.1 Fundamental properties

Fri. Mar 17, 2023 9:30 AM - 11:45 AM D209 (Building No. 11)

Kazumasa Iida(Nihon University), ai ikeda(NTT)

11:00 AM - 11:15 AM

[17a-D209-6] High-quality superconducting IV-nitride thin films prepared by MBE

〇Kosuke Takiguchi¹, Yoshiharu Krockenberger¹, Yoshitaka Taniyasu¹, Hideki Yamamoto¹ (1.NTT BRL)

Keywords:nitride, molecular beam epitaxy

We report the crystal growth of group-IV nitride superconducting metals by molecular beam epitaxy. By utilizing electron emission impact spectroscopy, we obtained the highest quality TiN thin film with RRR = 15.8. Also, we successfully grew single-orientated ZrN and HfN superconducting films.