2023年第70回応用物理学会春季学術講演会

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一般セッション(口頭講演)

10 スピントロニクス・マグネティクス » 10.2 スピン基盤技術・萌芽的デバイス技術

[18a-D704-1~11] 10.2 スピン基盤技術・萌芽的デバイス技術

2023年3月18日(土) 09:00 〜 12:00 D704 (11号館)

後藤 穣(阪大)、磯上 慎二(物材機構)

11:30 〜 11:45

[18a-D704-10] Orbital torque modulation by oxygen accumulation

Junyeon Kim1、Jun Uzuhashi2、Dongwook Go3,4、Daegeun Jo5、Tadakatsu Ohkubo2、Seiji Mitani2、Hyun-Woo Lee5、YoshiChika Otani6,1 (1.RIKEN-CEMS、2.NIMS、3.PGI-IAS、4.Univ. Mainz、5.POSTECH、6.ISSP, Univ. Tokyo)

キーワード:Orbital torque, Orbital Rashba effect, Orbital current

Nowadays, orbital transport draws a great interest in terms of a promising mechanism of spin manipulation. Injected orbital into a magnetic layer exerts a torque which is called orbital torque. Different to the spin polarization, the orbital polarization has a broad material selection range, not requiring heavy elements or magnetic materials.
Here we find a significant orbital torque modulation by oxygen accumulation in CoFe/Cu/Al2O3 thin films. The oxygen accumulation is controlled by oxygen-incorporation exposure time or annealing temperature. We evaluate orbital torque using the spin torque ferromagnetic resonance (ST-FMR) technique. Remarkably, the orbital torque is drastically varied by the oxygen accumulation with a factor of around ~3. Further information will be provided during the presentation.