[1P01-52] Poster Presentation

[1P42] Dependence of coloration efficiency of tungsten oxide films deposited by reactive sputtering on film thickness

*Shojiro Kurata¹, Md. Suruz Mian¹, Takeo Nakano¹ (1. Graduate School of Science and Technology, Seikei University)

We deposited WO₃ film on ITO substrates using reactive magnetron sputtering. Three different thicknesses of WO₃ films (500, 1000, and 1500 nm) were prepared by adjusting the deposition time. CV measurements were performed with WO₃/ITO as the working electrode. The voltage sweep range was -1.2~+1.6 V, and the scan rate was 10 mV/s. 50 cycles were performed, with coloration and bleaching as one cycle. Transmittance was measured for as-deposited films and at the time of colored and bleached at the initial and every 10 cycles from 10 to 50, respectively. As a result, the CEs of the 1000 nm and 1500 nm samples were about the same, but that of the 500 nm sample was higher than the others. This indicates that cations may enter differently at 500 nm than at 1000 and 1500 nm.