Closing Plenary session: Highly effective microfabrication

[M-PL-04-PLENARY] How much power can you handle? Status and strategies for high power ultrashort pulse applications

*Ulf Quentin¹, Daniel Flamm¹, Jonas Kleiner ¹, Max Kahmann¹, Marc Sailer², Dirk Sutter², Dominik Bauer², Klaus Albers², Alexander Killi² (1. TRUMPF Laser- und Systemtechnik GmbH, Ditzingen (Germany), 2. TRUMPF Laser GmbH, Schramberg (Germany))

キーワード：Status and strategies for high power ultrashort pulse applications

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