[D2-PR14] Slot 14

[D2-PR14-24] n-type and p-type SnO_x thin films deposited by reactive sputtering

*Yoonjin Kim¹, Takumi Sugane¹, Junjun Jia², Makoto Kashiwagi¹, Yuki Oguchi¹, Yuzo Shigesato¹ (1. Aoyama Gakuin Univ. (Japan), 2. Waseda Univ. (Japan))

キーワード：tin oxide (SnOx), tin monoxide (SnO), p-type semiconductor, n-type semiconductor, reactive sputtering